Dual-Sided Simultaneous Exposure Mask Aligner 'BS425' 'BS620'
Simultaneous exposure of both sides of the wafer! Supports medium lot production with semi-automatic operation.
The dual-sided simultaneous exposure mask aligners 'BS425' and 'BS620' have a proven track record in both research and development and small to medium lot production. They adopt a method where the primary exposure is simultaneous on both sides, and subsequent exposures are done one side at a time, making them simple and versatile, with customization available to meet specific needs. Since the secondary exposure and beyond are done on one side, a separate "sample stage" is required. Please feel free to contact us. 【Features】 ■ Supports maximum φ4 inch wafers 'BS425' ■ Supports maximum φ6 inch wafers 'BS620' ■ Compact design ■ Semi-automatic operation possible during primary exposure with a footswitch ■ Easy to accommodate non-standard shape samples due to the hand placement style ■ Equipped with wafer positioning guide (optional) and more *For more details, please refer to the catalog or feel free to contact us.
- 企業：ナノテック
- 価格：Other
