Dual-Sided Simultaneous Exposure Mask Aligner BS320
Simultaneous exposure of both sides of the wafer. Supports medium lot production with semi-automatic operation!
The BS320 dual-sided simultaneous exposure mask aligner has a proven track record in research and development as well as small to medium lot production. It adopts a method where the primary exposure is done simultaneously on both sides, and subsequent exposures are done one side at a time, making it a simple and versatile model. Customization to meet various needs is also available. Since the subsequent exposures are done on one side, a separate "sample stage" is required. The BS320u, which allows for simultaneous dual-sided exposure even after the primary exposure, is also part of the lineup. It supports semi-automatic operation for medium lot production. For more details, please contact us or refer to the catalog.
- Company：ナノテック
- Price：Other
